Sensors

The dataset gives information about the different gait metrics such as stride length for left and right foot, stride velocity for left and right foot and cadence collected from human subjects

in a controlled environment in the presence of VR(virtual reality) scenes such as positve, negative and neutral. The PHQ-9 score of the subjects is collected and correlated with

the gait score. Decriptive statitics such as median are also collected for the difference in the gait values of specific VR environments.

Maintaining etch uniformity from the center to the edge of the wafer during the etching process is a critical challenge. In particular, the edge of the wafer poses difficulties due to changes in the angle of ion incidence caused by the curvature of the sheath, making it challenging to achieve the desired etch pattern. Therefore, identifying and monitoring key factors that significantly impact center-to-edge uniformity is essential.

As semiconductor devices have become increasingly miniaturized, the ability to control very small Critical Dimensions (CDs) during the etching process has become crucial through controlled plasma processes. Consequently, diagnosing plasma and reflecting this in the process to enhance yield is of paramount importance. Typically, an invasive sensor like a Single Langmuir Probe (SLP) is utilized for plasma diagnostics. However, using this sensor can affect the plasma, necessitating the use of non-invasive diagnostic methods.

RLED contains 80,400 images and corresponding events, we utilized a photometer to continuously measure scene illumination and calculate the illumination value after attenuation at the event camera. The capture scenes included city (35.0%), suburbs (10.3%), town (14.5%), village (17.8%), and valley (22.4%). Half of the RLED frames are captured at a frame rate of 25 fps, and the other half at 10 fps. The exposure time is set to 1ms, 3ms, and 5ms based on the varying environmental illumination.