SERS spectrum of RHB solution measured on different patterns

Citation Author(s):
Qiang Zou, Shentong Mo, Xiaochang Pei
Submitted by:
Xiaochang Pei
Last updated:
Thu, 11/08/2018 - 10:34
DOI:
10.21227/H28M1D
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Abstract 

A novel surface-enhanced Raman scattering substrate based on integrated circuit (IC) process was designed, using photolithography, etching and other processes on the silicon wafer processing. Its surface morphology and Raman activity were characterized and tested. The relationship between the substrate’s photolithographic pattern and its Raman activity, stability and reproducibility has been analyzed and verified.

Instructions: 

We used rhodamine B as a molecular probe to study the SERS activity of the substrate. The solution concentration is 10-4M/L. We used Renishaw laser microscopy Raman spectrometer, with a laser wavelength of 633nm, a laser power of 5% and an integration time of 1.5s.