[1] Jeongeun Jeon,
"Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis",
IEEE Dataport,
2024. [Online]. Available: http://dx.doi.org/10.21227/65x1-n014. Accessed: Oct. 10, 2024.
@data{65x1-n014-24,
doi = {10.21227/65x1-n014},
url = {http://dx.doi.org/10.21227/65x1-n014},
author = {Jeongeun Jeon },
publisher = {IEEE Dataport},
title = {Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis},
year = {2024} }
doi = {10.21227/65x1-n014},
url = {http://dx.doi.org/10.21227/65x1-n014},
author = {Jeongeun Jeon },
publisher = {IEEE Dataport},
title = {Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis},
year = {2024} }
TY - DATA
T1 - Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis
AU - Jeongeun Jeon
PY - 2024
PB - IEEE Dataport
UR - 10.21227/65x1-n014
ER -
T1 - Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis
AU - Jeongeun Jeon
PY - 2024
PB - IEEE Dataport
UR - 10.21227/65x1-n014
ER -
Jeongeun Jeon.
(2024).
Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis.
IEEE Dataport.
http://dx.doi.org/10.21227/65x1-n014
Jeongeun Jeon,
2024.
Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis.
Available at:
http://dx.doi.org/10.21227/65x1-n014.
Jeongeun Jeon.
(2024).
"Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis."
Web.
1. Jeongeun Jeon.
Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis [Internet].
IEEE Dataport; 2024.
Available from :
http://dx.doi.org/10.21227/65x1-n014
Jeongeun Jeon.
"Study on Etching Characteristics of Oxide and Nitride in N₂-Mixed CF₄/O₂ Plasma via OES Analysis."
doi:
10.21227/65x1-n014