As semiconductor devices have become increasingly miniaturized, the ability to control very small Critical Dimensions (CDs) during the etching process has become crucial through controlled plasma processes. Consequently, diagnosing plasma and reflecting this in the process to enhance yield is of paramount importance. Typically, an invasive sensor like a Single Langmuir Probe (SLP) is utilized for plasma diagnostics. However, using this sensor can affect the plasma, necessitating the use of non-invasive diagnostic methods.

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[1] Sangjeen Hong, Yunseong Cho, "Diagnostics wall harmonics current using wall flux sensor in Ar Plasma", IEEE Dataport, 2024. [Online]. Available: http://dx.doi.org/10.21227/r0ze-z552. Accessed: Oct. 10, 2024.
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url = {http://dx.doi.org/10.21227/r0ze-z552},
author = {Sangjeen Hong; Yunseong Cho },
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title = {Diagnostics wall harmonics current using wall flux sensor in Ar Plasma},
year = {2024} }
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T1 - Diagnostics wall harmonics current using wall flux sensor in Ar Plasma
AU - Sangjeen Hong; Yunseong Cho
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Sangjeen Hong, Yunseong Cho. (2024). Diagnostics wall harmonics current using wall flux sensor in Ar Plasma. IEEE Dataport. http://dx.doi.org/10.21227/r0ze-z552
Sangjeen Hong, Yunseong Cho, 2024. Diagnostics wall harmonics current using wall flux sensor in Ar Plasma. Available at: http://dx.doi.org/10.21227/r0ze-z552.
Sangjeen Hong, Yunseong Cho. (2024). "Diagnostics wall harmonics current using wall flux sensor in Ar Plasma." Web.
1. Sangjeen Hong, Yunseong Cho. Diagnostics wall harmonics current using wall flux sensor in Ar Plasma [Internet]. IEEE Dataport; 2024. Available from : http://dx.doi.org/10.21227/r0ze-z552
Sangjeen Hong, Yunseong Cho. "Diagnostics wall harmonics current using wall flux sensor in Ar Plasma." doi: 10.21227/r0ze-z552