The reliability of In-Si-O (ISO) thin-film transistors (TFT) to bias voltage-stress and photo-stress is studied. The ISO TFTs were developed with a fully photolithographic process, with a maximum temperature of 200 C. The TFTs typically showed a mobility of 5.03 cm$^2$/Vs, a threshold voltage, $V_{th}$, of -0.16 V and a subthreshold swing of 312 mV/dec. The TFTs were biased for up to four hours at different temperatures and illumination. Threshold voltage shifts were observed and modeled.

Dataset Files

You must be an IEEE Dataport Subscriber to access these files. Subscribe now or login.

[1] Guangyu Yao, "Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''", IEEE Dataport, 2019. [Online]. Available: http://dx.doi.org/10.21227/0cbc-5b56. Accessed: Mar. 20, 2025.
@data{0cbc-5b56-19,
doi = {10.21227/0cbc-5b56},
url = {http://dx.doi.org/10.21227/0cbc-5b56},
author = {Guangyu Yao },
publisher = {IEEE Dataport},
title = {Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''},
year = {2019} }
TY - DATA
T1 - Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''
AU - Guangyu Yao
PY - 2019
PB - IEEE Dataport
UR - 10.21227/0cbc-5b56
ER -
Guangyu Yao. (2019). Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''. IEEE Dataport. http://dx.doi.org/10.21227/0cbc-5b56
Guangyu Yao, 2019. Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''. Available at: http://dx.doi.org/10.21227/0cbc-5b56.
Guangyu Yao. (2019). "Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''." Web.
1. Guangyu Yao. Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors'' [Internet]. IEEE Dataport; 2019. Available from : http://dx.doi.org/10.21227/0cbc-5b56
Guangyu Yao. "Data set for paper ''Reliability of Low-Temperature Fully Photolithographic In-Si-O Thin-Film Transistors''." doi: 10.21227/0cbc-5b56